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A microscopically accurate model of partially ballistic nanoMOSFETs in saturation based on channel backscattering

机译:一种显微精确的部分弹道纳米mOsFET的模型   基于信道反向散射的饱和度

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摘要

We propose a model for partially ballistic MOSFETs and for channelbackscattering that is alternative to the well known Lundstrom model and ismore accurate from the point of view of the actual energy distribution ofcarriers. The key point is that we do not use the concept of "virtual source".Our model differs from the Lundstrom model in two assumptions: i) thereflection coefficients from the top of the energy barrier to the drain andfrom top of the barrier to the source are approximately equal (whereas in theLundstrom model the latter is zero), and ii) inelastic scattering is assumedthrough a ratio of the average velocity of forward-going carriers to that ofbackward-going carriers at the top of the barrier kv > 1 (=1 in the Lundstrommodel). We support our assumptions with 2D full band Monte Carlo (MC)simulations including quantum corrections in nMOSFETs. We show that our modelallows to extract from the electrical characteristics a backscatteringcoefficient very close to that obtained from the solution of the Boltzmanntransport equation, whereas the Lundstrom model overestimates backscattering byup to 40%.
机译:我们提出了一种用于部分弹道MOSFET和通道反向散射的模型,该模型可以替代众所周知的Lundstrom模型,并且从载流子的实际能量分布的角度来看,它更精确。关键是我们不使用“虚拟源”的概念。我们的模型与Lundstrom模型的不同之处在于两个假设:i)从能量势垒顶部到漏极以及从势垒顶部到源极的反射系数近似相等(而在伦德斯特伦模型中后者为零),并且ii)通过在屏障kv> 1(= 1的顶部)处的前向载波与后向载波的平均速度之比来假设非弹性散射在Lundstrommodel中)。我们用2D全频带蒙特卡罗(MC)模拟(包括nMOSFET中的量子校正)来支持我们的假设。我们表明,我们的模型允许从电学特性中提取非常接近于从玻耳兹曼传输方程解获得的反向散射系数,而Lundstrom模型则将反向散射高估了40%。

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